SAN FRANCISCO — While the industry is targeting 157nm lithography for the 45nm node in 2007, International Sematech is challenging suppliers to have it ready by 2005 for use with 65nm design rules. If ...
Integrating the exotic materials that will be required below the 90nm node may prove to be more than problematic. “Fabs aren’t going to keep Moore’s Law going with litho tools. It’s going to require ...
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